Titre du document / Document title

Enhanced Bone Cells Growth and Proliferation on Ti0₂ Nanotubular Substrates Treated by RF Plasma Discharge

Auteur(s) / Author(s)

MAHMOOD Meena ; FEJLEH Philip ; KARMAKAR Alokita ; FEJLEH Ashley ; YANG XU ; KANNARPADY Ganesh ; ISHIHARA Hidetaka ; SHARMA Rajesh ; ZHONGRUI LI ; GHOSH Anindya ; TRIGWELL Steve ; HARDCASTLE Franklin D. ; CASCIANO Daniel ; SELVADURAY Guna ; BIRIS Alexandru S. ;

Résumé / Abstract

Titanium implants are well known for their biocompatibility, especially if bioinertness is desired, due to the Ti0₂ native oxide which is thermodynamically and chemically very stable. One of the major problems with this material involve its inability to induce enhanced cellular adhesion and proliferation on its surface without complicated structural approaches, leading to the possible lack of bone-implant interfacial interaction and rejection. In order to potentially improve osseointegration of such implants self-assembled vertical and ordered nanotubular TiO₂ arrays were fabricated by electrochemical anodization and were plasma treated under O₂, N₂, O₂ + N₂, and He gaseous environments and their properties analyzed by various analytical procedures. Osteoblast bone cells (MC3T3-E1) were grown on Ti0₂ nanotube-arrayed substrates and their proliferation was analyzed and quantified. Oxygen and nitrogen plasma treatments were found to significantly improve the proliferation of the bone cells over the TiO₂ nanoarray substrates, with the O₂ + N₂ combination yielding the most significant improvements. These findings may be explained by the interactions between the cells and the changes in the surface chemistry induced by the O₂ and N₂ groups introduced by the plasma discharge treatment onto the TiO₂ surfaces.

Revue / Journal Title

Advanced engineering materials    ISSN  1438-1656 

Source / Source

2011, vol. 13, n^o3, [Note(s): B95-B101]

Langue / Language

Anglais

Editeur / Publisher

Wiley-VCH, Weinheim, ALLEMAGNE  (1999) (Revue)

Localisation / Location

INIST-CNRS, Cote INIST : 27060, 35400019072769.0160