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Titre du document / Document title

Titanium oxide thin films produced by pulsed laser deposition

Auteur(s) / Author(s)

SIMA C. ; GRIGORIU C. ; VIESPE C. ; PASUK I. ; MATEI E. ;

Résumé / Abstract

The structural peculiarities of titanium oxide films formed by pulsed laser deposition have been investigated. A pure titanium target was irradiated by a Nd:YAG laser (355 and 532 nm). The work studied the influence of the beam wavelength, and oxygen pressure (20, 40, 80, and 160 mTorr) upon the layer structure. The films deposited at room temperature were partly crystalline. The crystalline fraction was a mixture of titanium sub-oxides. The 532 nm wavelength seems to favour the oxidation of titanium leading to TiO2 formation even at room temperature. After annealing, crystalline TiO2- anatase formed at both irradiation wavelengths, but only at low oxygen pressures (20 and 40 mTorr). The best crystallization occurs in the layers deposited at the lowest oxygen pressure (20 mTorr), at both laser beam wavelengths; most anatase formed in the sample obtained at 20 mTorr, 532 nm. At 20 mTorr the films were compact, for both wavelengths, but also tilted or randomly distributed columnar grains were observed at higher pressure. The films deposited with 355 nm, were thinner than those with 532 nm; at 355 nm the thickness decreased at higher pressure, while at 532 nm the dependence was opposite.

Revue / Journal Title

Journal of optoelectronics and advanced materials    ISSN  1454-4164 

Source / Source

2009, vol. 11, no6, pp. 826-830 [5 page(s) (article)]

Langue / Language

Anglais

Editeur / Publisher

INOE 2000, Bucuresti,   (1999) (Revue)

Localisation / Location

INIST-CNRS, Cote INIST : 27497, 35400018836453.0090

Nº notice refdoc (ud4) : 21655104



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