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Titre du document / Document title

Nano-vanadium oxide thin films in mixed phase for microbolometer applications

Auteur(s) / Author(s)

SUBRAHMANYAM A. (1) ; BHARAT KUMAR REDDY Y. (1) ; NAGENDRA C. L. (2) ;

Affiliation(s) du ou des auteurs / Author(s) Affiliation(s)

(1) Department of Physics, Indian Institute of Technology Madras, Chennai 600036, INDE
(2) LEOS, ISRO, Peenya Industrial Estate, Bangalore 560060, INDE

Résumé / Abstract

Among the several phases of vanadium oxide, mixed phases of VO2 and V205 are preferred for uncooled micro-bolometers with low noise. The aim of this investigation is to achieve mixed phase VO2 and V2O5 thin films with nanometre grain sizes and high temperature coefficient of resistance (TCR). Since the phase depends upon the oxygen reactivity, these vanadium oxide thin films are prepared by reactive electron beam evaporation at different oxygen flow rates and substrate temperatures. The mixed phases have been evaluated through x-ray diffraction and x-ray photo emission studies. The temperature dependence of resistance has shown that the films grown at 473 K with 2.8 x 10-5 mbar chamber pressure of oxygen (VO2 V205 ratio of 36: 64) have the highest TCR of -3.2 K-1 with a reasonable low resistance (12012/square).

Revue / Journal Title

Journal of physics. D, Applied physics    ISSN  0022-3727   CODEN JPAPBE 

Source / Source

2008, vol. 41, no19, [Note(s): 195108.1-195108.6] (21 ref.)

Langue / Language

Anglais

Editeur / Publisher

Institute of Physics, Bristol, ROYAUME-UNI  (1970) (Revue)

Mots-clés anglais / English Keywords

Nanostructures

;

Thin films

;

Vanadium oxide

;

Bolometers

;

Application

;

Electrical conductivity

;

X-ray photoelectron spectra

;

Atomic force microscopy

;

XRD

;

Electron beam evaporation

;

Reactive evaporation

;

Temperature coefficient

;

High temperature

;

Grain size

;

Background noise

;

Mots-clés français / French Keywords

V2O5

;

VO2

;

Nanostructure

;

Couche mince

;

Oxyde de vanadium

;

Bolomètre

;

Application

;

Conductivité électrique

;

Spectre photoélectron RX

;

Microscopie force atomique

;

Diffraction RX

;

Evaporation faisceau électronique

;

Evaporation réactive

;

Coefficient température

;

Haute température

;

Grosseur grain

;

Bruit fond

;

Mots-clés espagnols / Spanish Keywords

Vanadio óxido

;

Aplicación

;

Evaporación reactiva

;

Alta temperatura

;

Localisation / Location

INIST-CNRS, Cote INIST : 5841, 35400018585274.0360

Nº notice refdoc (ud4) : 20715361



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