Titre du document / Document title
Nano-vanadium oxide thin films in mixed phase for microbolometer applications
Auteur(s) / Author(s)
SUBRAHMANYAM A. (1) ;
BHARAT KUMAR REDDY Y. (1) ;
NAGENDRA C. L. (2) ;
Affiliation(s) du ou des auteurs / Author(s) Affiliation(s)
(1) Department of Physics, Indian Institute of Technology Madras, Chennai 600036, INDE
(2) LEOS, ISRO, Peenya Industrial Estate, Bangalore 560060, INDE
Résumé / Abstract
Among the several phases of vanadium oxide, mixed phases of VO
2 and V
20
5 are preferred for uncooled micro-bolometers with low noise. The aim of this investigation is to achieve mixed phase VO
2 and V
2O
5 thin films with nanometre grain sizes and high temperature coefficient of resistance (TCR). Since the phase depends upon the oxygen reactivity, these vanadium oxide thin films are prepared by reactive electron beam evaporation at different oxygen flow rates and substrate temperatures. The mixed phases have been evaluated through x-ray diffraction and x-ray photo emission studies. The temperature dependence of resistance has shown that the films grown at 473 K with 2.8 x 10
-5 mbar chamber pressure of oxygen (VO
2 V
20
5 ratio of 36: 64) have the highest TCR of -3.2 K
-1 with a reasonable low resistance (12012/square).
Revue / Journal Title
Journal of physics. D, Applied physics
ISSN
0022-3727
CODEN JPAPBE
Source / Source
2008, vol. 41, n
o19, [Note(s): 195108.1-195108.6] (21 ref.)
Langue / Language
Anglais
Editeur / Publisher
Institute of Physics, Bristol, ROYAUME-UNI
(1970)
(Revue)
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Localisation / Location
INIST-CNRS, Cote INIST : 5841, 35400018585274.0360
Nº notice refdoc (ud4) : 20715361
