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Titre du document / Document title

Oxidation of synthetic and natural samples of enargite and tennantite : 2. X-ray photoelectron spectroscopic study

Auteur(s) / Author(s)

FULLSTON D. (1) ; FORNASIERO D. (1) ; RALSTON J. (1) ;

Affiliation(s) du ou des auteurs / Author(s) Affiliation(s)

(1) Ian Wark Research Institute, University of South Australia, The Levels Campus, Mawson Lakes, South Australia 5095, AUSTRALIE

Résumé / Abstract

The surface oxidation of synthetic and natural samples of enargite and tennantite has been monitored by X-ray photoelectron spectroscopy, XPS. The minerals were conditioned at pH 11.0 in an aqueous solution purged with nitrogen gas for 20 minor with oxygen gas for 60 min. The XPS results show that the oxidation layer on the mineral surface is thin. The surface oxidation products comprise copper and arsenic oxide/ hydroxide, sulfite, and a sulfur-rich layer made of metal-deficient sulfide and/or polysulfide. The proportion of all of these oxidation products at the mineral surface is more important when the minerals are treated in more oxidizing conditions (i.e., with oxygen gas and for a longer time) for tennantite than for enargite and for the natural samples than for the synthetic samples. Different arsenic sulfide species have been found at the surfaces of enargite and tennantite: As4S4 or As2S3 constitutes the major arsenic sulfide species at the surface of enargite, but these are the minor arsenic sulfide species at the surface of tennantite and in the bulk of both minerals. This difference is not related to a surface impurity in the natural enargite sample as it is also observed in the synthetic enargite sample.

Revue / Journal Title

Langmuir    ISSN  0743-7463   CODEN LANGD5 

Source / Source

1999, vol. 15, no13, pp. 4530-4536 (33 ref.)

Langue / Language

Anglais

Editeur / Publisher

American Chemical Society, Washington, DC, ETATS-UNIS  (1985) (Revue)

Mots-clés anglais / English Keywords

Inorganic compound

;

Arsenic compound

;

Oxidation

;

Surface reaction

;

Surface analysis

;

X ray diffraction

;

Photoelectron spectrometry

;

Aqueous solution

;

Mots-clés français / French Keywords

Composé minéral

;

Arsenic composé

;

Oxydation

;

Réaction surface

;

Analyse surface

;

Diffraction RX

;

Spectrométrie photoélectron

;

Solution aqueuse

;

Tennantite

;

Enargite

;

Mots-clés espagnols / Spanish Keywords

Compuesto inorgánico

;

Arsénico compuesto

;

Oxidación

;

Reacción superficie

;

Análisis superficie

;

Difracción RX

;

Espectrometría fotoelectrón

;

Solución acuosa

;

Localisation / Location

INIST-CNRS, Cote INIST : 20642, 35400008551658.0370

Nº notice refdoc (ud4) : 1856931



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