Titre du document / Document title

Role of the functional groups of complexing agents in copper slurries

Auteur(s) / Author(s)

PATRI Udaya B. ; AKSU Serdar ; BABU S. V. ;

Résumé / Abstract

We investigate the role of -NH₂ and -COOH functional groups of complexing agents in H₂O₂-based slurries in controlling copper (Cu) removal rates. Slurries containing complexing agents with two of the same functional groups (succinic acid: HOOC-CH₂CH₂-COOH, ethylene diamine: H₂N-CH₂CH₂-NH₂) and a complexing agent containing one each of the functional groups (β-alanine: H₂N-CH₂CH₂-COOH), all with the same carbon chain length, were investigated. Along with dissolution and disk polish experiments, potential-pH diagrams were constructed for these three systems in the presence of H₂O. The dissolution and polish rates are consistent with the known activity of carboxylic acids (with -COOH groups) at acidic conditions and that of amines (with -NH₂ groups) in an alkaline environment. The observed trends in the removal rates with all these slurries are explained using potential-pH diagrams, UV/visible spectra, and electrochemical experiments. When compared to glycine (H₂N-CH₂-COOH), β-alanine (H₂N-CH₂CH₂-COOH) produced higher removal rates at acidic pH values and lower removal rates at alkaline pH values. Finally, succinic acid and β-alanine-based slurries were found to result in lower dissolution rates and higher polish rates compared to glycine-based slurries at pH 4.

Revue / Journal Title

Journal of the Electrochemical Society   ISSN 0013-4651   CODEN JESOAN 

Source / Source

2006, vol. 153, n^o7, [Note(s): G650-G659]

Langue / Language

Anglais

Editeur / Publisher

Electrochemical Society, Pennington, NJ, ETATS-UNIS  (1948) (Revue)

Localisation / Location

INIST-CNRS, Cote INIST : 4925, 35400013883237.0680