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Titre du document / Document title

Water usage reduction in a semiconductor fabricator

Auteur(s) / Author(s)

KLUSEWITZ Greg (1) ; MC VEIGH Jim (1) ;

Affiliation(s) du ou des auteurs / Author(s) Affiliation(s)

(1) Fairchild Semiconductor Corporation, 125 Crestwood Road, Mountaintop PA 18707, ETATS-UNIS

Résumé / Abstract

Semiconductor fabricators use immense amounts of water. A large portion of this water is used to produce Ultra Pure Water (UPW) also referred to as DI (Deionized) water. This water is used to rinse and clean semiconductor wafers in the manufacturing process. Approximately 1500 gallons of city water are required to produce 1000 gallons of UPW. More than 2000 gallons of UPW can be used in the production of one, eight inch wafer and large facilities can use 3 million gallons of UPW per day (1). The cost for generating UPW is approximately $12 per 1000 gallons. Producing the UPW also involves UV lamps, filters, pumps, and recirculating systems that require energy to operate. Approximately 46kWH can be saved for every 1000 gallons of UPW conserved. For a facility using 3 million gallons of UPW daily, reducing the UPW by only 10% can result in an annual savings of 5 million kWH, or about $225,000, at an energy purchase of 4.5 cents per kWH. It is also costly to remove the effluent through the water treatment plant. This paper describes the methodology and results of a cross-functional team to reduce the UPW usage in the Fairchild Mountaintop six inch facility. The team was comprised of process technicians, process engineers, facility engineers, and equipment vendors. Reduction efforts, which were initiated in February, 2001, included rinse sink, process, and supply modifications. The goal was to reduce the DI usage by 2 million gallons within one year. The annual savings as a result of this team's efforts are projected to approach 18 million gallons of DI water or about $214,000.

Revue / Journal Title

ASMC proceedings    ISSN  1078-8743 

Source / Source

ASMC 2002 : advancing the science and technology of semiconductor manufacturing :   ( Boston MA, 30 April - 2 May 2002 )
IEEE / SEMI advanced semiconductor manufacturing conference and workshop, Boston MA , ETATS-UNIS (30/04/2002)
2002  , pp. 340-346[Note(s) : V, 430 p., ] [Document : 7 p.] (bibl.: dissem.) ISBN 0-7803-7158-5 ;  Illustration : Illustration ;

Langue / Language


Editeur / Publisher

IEEE, Piscataway NJ, ETATS-UNIS  (2002) (Monographie)

Mots-clés anglais / English Keywords

Light sources


Manufacturing processes




Mots-clés français / French Keywords

Source lumière


Procédé fabrication


Pastille électronique


Mots-clés espagnols / Spanish Keywords

Industria electrónica


Fabricación microeléctrica


Localisation / Location

INIST-CNRS, Cote INIST : Y 38006, 35400011785210.0660

Nº notice refdoc (ud4) : 15852738

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