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Titre du document / Document title

How low can impurities in pure water be analyzed by ICP-MS?

Auteur(s) / Author(s)

KAWABATA Katsu (1) ; KISHI Yoko (1) ;

Affiliation(s) du ou des auteurs / Author(s) Affiliation(s)

(1) PerkinElmer Life and Analytical Sciences, 71 Four Valley Drive, Concord, ON, L4K 4V8, CANADA

Résumé / Abstract

Elements such as Si, B, Fe, K, and Ca are difficult to determine at levels lower than 1 pg/mL (ppt) using ICP-MS due to a high background. There are two sources of background: isobaric or polyatomic ion interferences due to plasma Ar and sample matrices, and contamination from sample introduction devices. Several techniques have been used for the elimination of isobaric and polyatomic ion interferences. High resolution ICP-MS can separate analytes from interferences, but some elements require an extremely high resolution, which sacrifices the sensitivity of the analytes. The cool plasma technique can eliminate interferences that have a higher ionization potential, but elements having a higher ionization potential or strong bond energy with oxygen cannot be determined. Dynamic reaction cell (DRC) technology can effectively reduce the interferences by chemical resolution that the cool plasma technique cannot. In addition, the non-extraction lens design allows for very low level B determination. In this paper, several sample introduction devices and operating conditions with the DRC-ICP-MS were evaluated to reduce background. The results of Si and B in pure waters clearly show the difference between the multiple water collection sites at less than ng/mL (ppb) level.

Revue / Journal Title

Atomic spectroscopy    ISSN  0195-5373   CODEN ASPND7 

Source / Source

2003, vol. 24, no2, pp. 73-77 [5 page(s) (article)] (3 ref.)

Langue / Language

Anglais

Editeur / Publisher

Perkin Elmer, Shelton, CT, ETATS-UNIS  (1980) (Revue)

Mots-clés anglais / English Keywords

Electronics industry

;

Mass spectrometry

;

Inductive coupling plasma spectrometry

;

Coupled method

;

Water

;

Inorganic element

;

Quantitative analysis

;

Multicomponent analysis

;

Chemical analysis

;

Purity control

;

Trace analysis

;

Mots-clés français / French Keywords

Industrie électronique

;

Spectrométrie masse

;

Spectrométrie ICP

;

Méthode couplée

;

Eau

;

Elément minéral

;

Analyse quantitative

;

Analyse multiélément

;

Analyse chimique

;

Contrôle pureté

;

Analyse trace

;

Mots-clés espagnols / Spanish Keywords

Industria electrónica

;

Espectrometría masa

;

Espectrometría ICP

;

Método acoplado

;

Agua

;

Elemento inorgánico

;

Análisis cuantitativo

;

Análisis multielemento

;

Análisis químico

;

Verificación pureza

;

Análisis huella

;

Localisation / Location

INIST-CNRS, Cote INIST : 14108, 35400011840791.0080

Nº notice refdoc (ud4) : 14868692



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