Titre du document / Document title

Examination of the sputtering profile of NiTi under target heating conditions

Auteur(s) / Author(s)

HO Ken K. ⁽¹⁾ ; MOHANCHANDRA K. P ⁽¹⁾ ; CARMAN Gregory P. ⁽¹⁾ ;

Affiliation(s) du ou des auteurs / Author(s) Affiliation(s)

⁽¹⁾ Mechanical & Aerospace Engineering University of California, LA, 38-137m Engineering IV, P.O. Box 951597, Los Angeles, CA 90095, ETATS-UNIS

Résumé / Abstract

In this paper we have examined compositional shifts in NiTi film sputter-deposited from a heated and a cooled target. Substrates were radially placed at 18° intervals to capture the semicircular sputtering profile. The composition of the film was measured using Rutherford backscattering spectroscopy (RBS). Film thickness values were measured and the atomic flux captured was calculated. Results indicate that the target temperature significantly influences the composition of the sputtered film. It was found that, for cold targets, Ni and Ti sputter at different angles, producing a compositional shift in the film when compared with the target. For hot targets the sputtering angle is influenced to a lesser degree, such that the compositional shift is negligible. Therefore, target temperature appears to represent an approach to alter the stoichiometry of films deposited.

Revue / Journal Title

Thin solid films   ISSN 0040-6090   CODEN THSFAP 

Source / Source

2002, vol. 413, n^o1-2, pp. 1-7 (18 ref.)

Langue / Language

Anglais

Editeur / Publisher

Elsevier, Lausanne, SUISSE  (1967) (Revue)

Mots-clés anglais / English Keywords

Transition element alloys ; Thickness ; Titanium alloys ; Nickel base alloys ; Shape memory alloy ; Binary alloys ; Fabrication property relation ; Growth from vapor ; Sputtering ; Chemical composition ; Thin films ; Theoretical study ; Experimental study ;

Mots-clés français / French Keywords

Métal transition alliage ; Ni Ti ; Alliage Ni55Ti45 ; Epaisseur ; Titane alliage ; Alliage base nickel ; Alliage mémoire forme ; Alliage binaire ; Relation fabrication propriété ; Méthode phase vapeur ; Pulvérisation irradiation ; Composition chimique ; Couche mince ; Etude théorique ; Etude expérimentale ;

Mots-clés espagnols / Spanish Keywords

Aleación memoria forma ; Relación fabricación propiedad ; Método fase vapor ;

Localisation / Location

INIST-CNRS, Cote INIST : 13597, 35400010892751.0010